Abstract

Electron beam lithography provides the possibility of precise control of nanostructure characteristics that form the basis of various nanotechnologies. The nanostructure fabrication and measurement group advances lithography precision at the nanometer scale and creates processes for manufacturing innovative devices and standards in physical fields ranging from photonics to fluids.< /span>Such measurements create a positive feedback loop for the fabrication and measurement of nanostructures.Electron beam lithography is used for pattern standards for atomic force correlation microscopy and ultra-resolution optical microscopy, with highthroughput precision localization and process parameter characterization and optimization.