Abstract

The use of AFM for scanning probe lithography also suffers from power-related problems, but it is better suited than STM for this task due to the less stringent requirements of the technique: no very high vacuum conditions. , conductive surface or very good tip-to-sample distance control is required. Scanning probe nanolithography based on AFM can be performed through different mechanisms and offers a wide range of possibilities . Therefore, the AFM tip can produce localized changes in the composition, height, or physical/chemical properties of surfaces through thermal effects, mechanical effects, deposition, chemical effects, etc. The principle of this technique for making electronic nano devices has been drawn and the example of making Si nanowires based on the oxidation of nanolithography probe Scanning is done. A derived technique that has become very popular is dip-pen nanolithography, in which the tip deposits specific inks with excellent clarity at desired locations.